INCREASE IN TRANSMITTANCE OF UNBACKED ALUMINUM FILTERS EXPOSED TO RF OR DC DISCHARGES IN OXYGEN

被引：18

作者：

HUNTER, WR

STEELE, GN

GILLETTE, RB

机构：

[1] USN,EO HULBURT CTR SPACE RES,RES LAB,WASHINGTON,DC 20375

[2] LUXEL CORP,SANTA BARBARA,CA 93111

[3] BOEING AEROSP CORP,SEATTLE,WA 98124

来源：

APPLIED OPTICS | 1973年 / 12卷 / 12期

关键词：

D O I：

10.1364/AO.12.002800

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：2800 / 2802

页数：3

共 12 条

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[3] HUNTER WR, UNPUBLISHED DATA
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[5] LOCKER LD, 1968, MAY P INT C MAT TECH, P319
[6] ON VACUUM-ULTRAVIOLET REFELECTANCE OF EVAPORATED ALUMINUM BEFORE AND DURING OXIDATION
MADDEN, RP
HASS, G
CANFIELD, LR
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1963, 53 (05) : 620 - &
[7] MICHELS DJ, PRIVATE COMMUNICATIO
[8] NYCE AC, THESIS U MARYLAND
[9] PLASMA ANODIZATION OF METALS AND SEMICONDUCTORS
OHANLON, JF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (02): : 330 - &
[10] OSANTOWSKI JF, PRIVATE COMMUNICATIO