PLASMA ANODIZATION OF METALS AND SEMICONDUCTORS

被引：46

作者：

OHANLON, JF

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1970年 / 7卷 / 02期

关键词：

D O I：

10.1116/1.1315852

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：330 / &

相关论文

共 42 条

[1] Brown S B, 1959, BASIC DATA PLASMA PH, P275
[2] COBINE JD, 1968, GASEOUS CONDUCTORS, P134
[3] COBINE JD, 1968, GASEOUS CONDUCTORS, P214
[4] A NEW METHOD FOR DETERMINATION OF PLASMA ELECTRON TEMPERATURE IN FLOATING DOUBLE PROBE
DOTE, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1968, 7 (08) : 964 - &
[5] FOPIANO PJ, 1965, IEEE T PARTS MATERIA, VPMP1, pS217
[6] FRANCIS A, 1956, HANDBUCH PHYSIK, V22, P53
[7] DIRECT NITRIDATION OF SILICON SUBSTRATES
FRIESER, RG
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (10) : 1092 - &
[8] HOT-ELECTRON TRANSPORT IN AL-AL2O3 TRIODES PRODUCED BY PLASMA OXIDATION
HUBER, EE
JOHNSTON, FL
KIRK, CT
[J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (11) : 5104 - &
[9] GAS PHASE ANODIZATION OF TANTALUM
JENNINGS, TA
MCNEILL, W
SALOMON, RE
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (11) : 1134 - &
[10] SPUTTERING DUE TO NEGATIVE OXYGEN IONS IN OXYGEN DISCHARGES
JENNINGS, TA
MCNEILL, W
[J]. APPLIED PHYSICS LETTERS, 1968, 12 (02) : 25 - &

← 1 2 3 4 5 →