PLASMA ANODIZATION OF METALS AND SEMICONDUCTORS

[11] JENNINGS TA, 1969, EL SOC EXT ABSTR, V6, P53

[12] A FLOATING DOUBLE PROBE METHOD FOR MEASUREMENTS IN GAS DISCHARGES [J]. PHYSICAL REVIEW, 1950, 80 (01): : 58 - 68

[13] JOHNSON MC, 1964, P IRE ELECTRON COMPO, P1

[14] LEE WL, 1969, EL SOC EXT ABSTR, V6, P51

[15] LERTES K, 1968, Z ANGEW PHYSIK, V24, P147

[16] CURRENTS THROUGH THIN FILMS OF ALUMINUM NITRIDE [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1968, 29 (07) : 1255 - &

[17] SILICON OXIDATION IN AN OXYGEN PLASMA EXCITED BY MICROWAVES [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (09) : 2703 - +

[18] SPUTTERING OF OXIDE FILMS IN PLASMA ANODIZATION OF ALUMINUM [J]. APPLIED PHYSICS LETTERS, 1968, 12 (11) : 396 - &

[19] LOCKER LD, 1968, EL SOC EXT ABSTR, V5, P387

[20] Loeb L.B., 1955, BASIC PROCESSES GASE

[11] JENNINGS TA, 1969, EL SOC EXT ABSTR, V6, P53

[12] A FLOATING DOUBLE PROBE METHOD FOR MEASUREMENTS IN GAS DISCHARGES [J]. PHYSICAL REVIEW, 1950, 80 (01): : 58 - 68

[13] JOHNSON MC, 1964, P IRE ELECTRON COMPO, P1

[14] LEE WL, 1969, EL SOC EXT ABSTR, V6, P51

[15] LERTES K, 1968, Z ANGEW PHYSIK, V24, P147

[16] CURRENTS THROUGH THIN FILMS OF ALUMINUM NITRIDE [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1968, 29 (07) : 1255 - &

[17] SILICON OXIDATION IN AN OXYGEN PLASMA EXCITED BY MICROWAVES [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (09) : 2703 - +

[18] SPUTTERING OF OXIDE FILMS IN PLASMA ANODIZATION OF ALUMINUM [J]. APPLIED PHYSICS LETTERS, 1968, 12 (11) : 396 - &

[19] LOCKER LD, 1968, EL SOC EXT ABSTR, V5, P387

[20] Loeb L.B., 1955, BASIC PROCESSES GASE