PLASMA-ASSISTED DEPOSITION TECHNIQUES FOR HARD COATINGS

被引：4

作者：

BUNSHAH, RF

DESHPANDEY, C

机构：

[1] Department of Materials Science and Engineering, School of Engineering and Applied Science, University of California, Los Angeles

来源：

VACUUM | 1990年 / 41卷 / 7-9期

关键词：

D O I：

10.1016/0042-207X(90)94222-C

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper reviews the most commonly used deposition techniques for hard coatings, namely Plasma-Assisted Chemical Vapor deposition (PACVD), Reactive Sputtering (RS) and Activated Reactive Sputtering (ARE). The role of plasma parameters and process parameters as well as their interdependency is discussed in terms of the three steps in deposition of films, i.e. generation of the depositing species, transport from source to substrate and film growth on the substrate.

引用

页码：2190 / 2195

页数：6

共 25 条

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