A TASIX BARRIER FOR LOW RESISTIVITY AND HIGH-RELIABILITY OF CONTACTS TO SHALLOW DIFFUSION REGIONS IN SILICON

被引：6

作者：

NEPPL, F

FISCHER, F

SCHWABE, U

机构：

来源：

THIN SOLID FILMS | 1984年 / 120卷 / 04期

关键词：

D O I：

10.1016/0040-6090(84)90240-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：257 / 266

页数：10

共 18 条

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