NITRIDES OF TITANIUM, NIOBIUM, TANTALUM AND MOLYBDENUM GROWN AS THIN-FILMS BY THE ATOMIC LAYER EPITAXY METHOD

被引：102

作者：

HILTUNEN, L

LESKELA, M

MAKELA, M

NIINISTO, L

NYKANEN, E

SOININEN, P

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(88)90375-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：149 / 154

页数：6

共 26 条

[1] ASPLUND M, 1986, MATER RES SOC S P, V54, P541
[2] PROPERTIES OF NBN THIN-FILMS DEPOSITED ON AMBIENT-TEMPERATURE SUBSTRATES
BACON, DD
ENGLISH, AT
NAKAHARA, S
PETERS, FG
SCHREIBER, H
SINCLAIR, WR
VANDOVER, RB
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (11) : 6509 - 6516
[3] BLOCHER JM, 1982, DEPOSITION TECHNOLOG, P585
[4] CUKAUSKAS EJ, 1986, ADV CRYOGEN ENG, V32, P643
[5] ATOMIC LAYER EPITAXY
GOODMAN, CHL
PESSA, MV
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (03) : R65 - R81
[6] GREBTSOVA OM, 1985, J APPL CHEM-USSR+, V58, P2011
[7] GREBTSOVA OM, 1985, ZH PRIKL KHIM, V58, P2181
[8] UPPER-CRITICAL-FIELD LIMITS FOR BULK TYPE-2 SUPERCONDUCTORS
HAKE, RR
[J]. APPLIED PHYSICS LETTERS, 1967, 10 (06) : 189 - +
[9] IGARASHI M, 1982, 9TH P INT C VAC MET, P1
[10] Juang J. Y., 1986, ADV CRYOGEN ENG, V32, P651