CURRENT INDUCED AVALANCHE IN EPITAXIAL STRUCTURES

被引:41
作者
WROBEL, TF [1 ]
COPPAGE, FN [1 ]
HASH, GL [1 ]
SMITH, AJ [1 ]
机构
[1] KTECH CORP,ALBUQUERQUE,NM 87110
关键词
D O I
10.1109/TNS.1985.4334056
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:3991 / 3995
页数:5
相关论文
共 7 条
[1]  
AZAREWICZ JL, 1983, DNATR81339 JAYC REP
[2]  
GHANDHI SK, 1977, SEMICONDUCTOR DEVICE
[3]  
SMITH AB, UNPUB
[4]  
SZE SM, 1981, PHYSICS SEMICONDUCTO
[5]   CURRENT GAIN AND CUTOFF FREQUENCY FALLOFF AT HIGH CURRENTS [J].
WHITTIER, RJ ;
TREMERE, DA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (01) :39-+
[6]   HIGH-DOSE RATE BURNOUT IN SILICON EPITAXIAL TRANSISTORS [J].
WROBEL, TF ;
AZAREWICZ, JL .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1980, 27 (06) :1411-1415
[7]  
WROBEL TF, 1974, INTELRT8025480 IRT C