VARIATIONS OF DC-RESISTANCE AND SERS INTENSITY DURING EXPOSURE OF COLD-DEPOSITED SILVER FILMS

被引:21
作者
HOLZAPFEL, C
AKEMANN, W
SCHUMACHER, D
OTTO, A
机构
[1] Heinrich-Heine-Universität Düsseldorf
关键词
D O I
10.1016/0039-6028(90)90399-S
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The decrease of the resistance and the intensity of surface enhanced Raman scattering (SERS) by C2H4 saturate at the same submonolayer coverage. The "active" C2H4 molecules are most likely bound to "tunneling sites" within "porous grain boundaries". The quenching of SERS by postexposure to a submonolayer quantity of oxygen is connected with a relatively big increase of the resistivity. The results are discussed with respect to the models of "classical electromagnetic" and "electronic" enhancement. © 1990.
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页码:123 / 128
页数:6
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