APPROACHES TO DEEP ULTRAVIOLET PHOTOLITHOGRAPHY UTILIZING ACID HARDENED RESIN PHOTORESIST SYSTEMS

被引：10

作者：

THACKERAY, JW

ORSULA, GW

BOHLAND, JF

MCCULLOUGH, AW

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584502

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1620 / 1623

页数：4

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[3]

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[4]

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[5]

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[6]

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LIU, HY ;

DEGRANDPRE, MP ;

FEELY, WE .

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[8]

MCDONALD SA, 1985, P SPE, P177

[9]

POL V, 1986, P SOC PHOTO-OPT INS, V633, P6

[10]

SCHELLEKENS JPW, 1989, P SPIE, V86, P220