CHARACTERIZATION OF A HIGH-RESOLUTION NOVOLAK BASED NEGATIVE ELECTRON-BEAM RESIST WITH 4-MU-C/CM2 SENSITIVITY

被引：61

作者：

LIU, HY ^{[1
]}

DEGRANDPRE, MP ^{[1
]}

FEELY, WE ^{[1
]}

机构：

[1] ROHM & HAAS CO,SPRING HOUSE,PA 19477

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.583957

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：379 / 383

页数：5

共 16 条

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