POLY(BUTENE-1 SULFONE) - HIGHLY SENSITIVE POSITIVE RESIST

被引：43

作者：

BOWDEN, MJ ^{[1
]}

THOMPSON, LF ^{[1
]}

BALLANTYNE, JP ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.568520

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1294 / 1296

页数：3

相关论文

共 10 条

[1] Bowden M. J., 1975, J POLYM SCI POLYM S, V49, P221
[2] ELECTRON-IRRADIATION OF POLY(OLEFIN SULFONES) - APPLICATION TO ELECTRON-BEAM RESISTS
BOWDEN, MJ
THOMPSON, LF
[J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1973, 17 (10) : 3211 - 3221
[3] Bowden MJ, 1974, APPL POLYM S, V23, P99
[4] CHARLESBY A, 1960, ATOMIC RAD POLYM, P162
[5] FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .1. DEPTH-DOSE RESPONSE OF POLYMERIC ELECTRON-BEAM RESISTS
HEIDENREICH, RD
THOMPSON, LF
FEIT, ED
MELLIARS.CM
[J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (09) : 4039 - 4047
[6] POLYMERIC ELECTRON BEAM RESISTS
KU, HY
SCALA, LC
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 980 - &
[7] ON THE EFFECT OF HIGH ENERGY RADIATION TO POLYMERS .1. CROSS-LINKING AND DEGRADATION
SAITO, O
[J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1958, 13 (02) : 198 - 206
[8] EFFECTS OF HIGH ENERGY RADIATION ON POLYMERS .2. END-LINKING AND GEL FRACTION
SAITO, O
[J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1958, 13 (12) : 1451 - 1464
[9] NEW FAMILY OF POSITIVE ELECTRON-BEAM RESISTS-POLY(OLEFIN SULFONES)
THOMPSON, LF
BOWDEN, MJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (12) : 1722 - 1726
[10] ULBERREITER K, 1968, DIFFUSION POLYMERS, P218