ON THE INVESTIGATION OF DC PLASMATRON DISCHARGES BY OPTICAL-EMISSION SPECTROMETRY

被引:45
作者
SCHILLER, S [1 ]
HEISIG, U [1 ]
STEINFELDER, K [1 ]
STRUMPFEL, J [1 ]
VOIGT, R [1 ]
FENDLER, R [1 ]
TESCHNER, G [1 ]
机构
[1] VEB ZENTRUM FORSCH & TECHNOL MIKROELEKTR,DRESDEN,GER DEM REP
关键词
D O I
10.1016/0040-6090(82)90247-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:235 / 240
页数:6
相关论文
共 5 条
[1]   OPTICAL SPECTROSCOPY FOR DIAGNOSTICS AND PROCESS-CONTROL DURING GLOW-DISCHARGE ETCHING AND SPUTTER DEPOSITION [J].
GREENE, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (05) :1718-1729
[2]   GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MONITORING SPUTTER DEPOSITED FILM THICKNESS [J].
GREENE, JE ;
SEQUEDAO.F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :1144-1149
[3]   MECHANISMS OF REACTIVE SPUTTERING OF INDIUM .1. GROWTH OF INN IN MIXED AR-N2 DISCHARGES [J].
NATARAJAN, BR ;
ELTOUKHY, AH ;
GREENE, JE ;
BARR, TL .
THIN SOLID FILMS, 1980, 69 (02) :201-216
[4]  
SCHILLER S, 1981, VAKUUMTECHNIK, V30, P1
[5]   SPECTROSCOPIC INVESTIGATION OF REACTIVE SPUTTERING OF ALUMINIUM [J].
STIRLING, AJ ;
WESTWOOD, WD .
THIN SOLID FILMS, 1971, 7 (01) :1-&