PLASMA SOURCE ION-IMPLANTATION DOSE UNIFORMITY OF A 2X2 ARRAY OF SPHERICAL TARGETS

被引：67

作者：

CONRAD, JR ^{[1
]}

BAUMANN, S ^{[1
]}

FLEMING, R ^{[1
]}

MEEKER, GP ^{[1
]}

机构：

[1] CHARLES EVANS & ASSOCIATES INC, REDWOOD CITY, CA 94063 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 04期

关键词：

D O I：

10.1063/1.342942

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1707 / 1712

页数：6

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