FAST ELECTRON PATTERN GENERATOR HIGH-RESOLUTION - A VARIABLE SHAPED BEAM SYSTEM FOR SUBMICRON WRITING

被引：8

作者：

DECHAMBOST, E

FRICHET, A

CHARTIER, M

THE, HT

TROTEL, J

机构：

[1] Thomson-CSF, Orsay, Fr, Thomson-CSF, Orsay, Fr

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583398

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

LITHOGRAPHY

引用

页码：78 / 82

页数：5

共 10 条

[1]

DECHAMBOST E, 1982, OPTIK, V62, P189

[2]

DECHAMBOST E, 1980, OPTIK, V55, P357

[3]

DECHAMBOST E, 1986, J VAC SCI TECHNOL, V1, P73

[4] AN ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR SUB-MICRON VHSIC DEVICE FABRICATION [J].

KING, HJ ;

MERRITT, PE ;

OTTO, OW ;

OZDEMIR, FS ;

PASIECZNIK, J ;

CARROLL, AM ;

CAVAN, DL ;

ECKES, W ;

LIN, LH ;

VENEKLASEN, L ;

WIESNER, JC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :106-111

[5] EL-3 - A HIGH THROUGHPUT, HIGH-RESOLUTION E-BEAM LITHOGRAPHY TOOL [J].

MOORE, RD ;

CACCOMA, GA ;

PFEIFFER, HC ;

WEBER, EV ;

WOODARD, OC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :950-952

[6]

MUNRO E, 1974, OPTIK, V39, P450

[7] A HIGH-SPEED, HIGH-PRECISION ELECTRON-BEAM LITHOGRAPHY SYSTEM (SYSTEM-DESIGN) [J].

NAKAMURA, K ;

SAKITANI, Y ;

KONISHI, T ;

KOMODA, T ;

SAITOU, N ;

SUGAWARA, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :94-97

[8]

PETRIC P, 1983, SOLID STATE TECHNOL, P154

[9]

Pircher G., 1972, Revue Technique Thomson-CSF, V4, P685

[10]

TROTEL J, 1980, 9TH P INT S EL ION B, P137

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