COMPARISON OF RF SPUTTERED AND PLASMA POLYMERIZED THIN-FILMS OF TETRAFLUOROETHYLENE

被引：30

作者：

TIBBITT, JM ^{[1
]}

SHEN, M ^{[1
]}

BELL, AT ^{[1
]}

机构：

[1] UNIV CALIF,DEPT CHEM ENGN,BERKELEY,CA 94720

来源：

关键词：

D O I：

10.1016/0040-6090(75)90187-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：L43 / L45

页数：3

共 9 条

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[2] KOBAYASHI H, 1974, J MACROMOL SCI CHEM, VA 8, P1345, DOI 10.1080/00222337408068636
[3] KOBAYASHI H, 1974, MACROMOLECULES, V7, P280
[4] MATHIAS E, 1967, J PHYS CHEM-US, V71, P2673
[5] INSULATOR THIN FILMS FORMED BY GLOW DISCHARGE AND RADIATION TECHNIQUES
MEARNS, AM
[J]. THIN SOLID FILMS, 1969, 3 (03) : 201 - &
[6] RF SPUTTERING OF PLASTICS
MORRISON, DT
ROBERTSON, T
[J]. THIN SOLID FILMS, 1973, 15 (01) : 87 - 101
[7] SOME CHARACTERISTICS OF SPUTTERED POLYTETRAFLUOROETHYLENE FILMS
PRATT, IH
LAUSMAN, TC
[J]. THIN SOLID FILMS, 1972, 10 (01) : 151 - &
[8] TIBBIT JM, TO BE PUBLISHED
[9] THIN POLYMER FILMS
WHITE, M
[J]. THIN SOLID FILMS, 1973, 18 (02) : 157 - 172