A SIMPLE TECHNIQUE FOR THE DETERMINATION OF MECHANICAL STRAIN IN THIN-FILMS WITH APPLICATIONS TO POLYSILICON

[1] A SIMPLE TECHNIQUE FOR DETERMINING THE STRESS AT THE SI-SIO2 INTERFACE [J]. APPLIED PHYSICS LETTERS, 1980, 36 (10) : 829 - 831

[2] Gorman D.J., 1975, FREE VIBRATION ANAL

[3] GUCKEL H, 1980, ECE804 U WISC DEP EL

[4] Howe R. T., 1983, Sensors and Actuators, V4, P447, DOI 10.1016/0250-6874(83)85056-2

[5] STRESS IN POLYCRYSTALLINE AND AMORPHOUS-SILICON THIN-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) : 4674 - 4675

[6] POLYCRYSTALLINE SILICON MICROMECHANICAL BEAMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (06) : 1420 - 1423

[7] STRUCTURE AND STABILITY OF LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED SILICON FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (06) : 927 - 932

[8] TIMOSHENKO SP, 1972, MECHANICS MATERIALS

[1] A SIMPLE TECHNIQUE FOR DETERMINING THE STRESS AT THE SI-SIO2 INTERFACE [J]. APPLIED PHYSICS LETTERS, 1980, 36 (10) : 829 - 831

[2] Gorman D.J., 1975, FREE VIBRATION ANAL

[3] GUCKEL H, 1980, ECE804 U WISC DEP EL

[4] Howe R. T., 1983, Sensors and Actuators, V4, P447, DOI 10.1016/0250-6874(83)85056-2

[5] STRESS IN POLYCRYSTALLINE AND AMORPHOUS-SILICON THIN-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) : 4674 - 4675

[6] POLYCRYSTALLINE SILICON MICROMECHANICAL BEAMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (06) : 1420 - 1423

[7] STRUCTURE AND STABILITY OF LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED SILICON FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (06) : 927 - 932

[8] TIMOSHENKO SP, 1972, MECHANICS MATERIALS