PERFORMANCE OF A PLANAR MAGNETRON SPUTTERING APPARATUS WITH COMPLEX TARGETS

被引：2

作者：

CHEN, QM

FAN, YD

LI, HD

机构：

[1] Tsinghua Univ, Beijing, China, Tsinghua Univ, Beijing, China

来源：

VACUUM | 1988年 / 38卷 / 06期

关键词：

D O I：

10.1016/0042-207X(88)90594-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：491 / 495

页数：5

共 12 条

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