SUPERSTRUCTURE IN THIN-FILMS OF BI-BASED COMPOUNDS ON MGO

被引:12
作者
KOJIMA, K
SCHLOM, DG
KURODA, K
TANIOKU, M
HAMANAKA, K
ECKSTEIN, JN
HARRIS, JS
机构
[1] STANFORD UNIV, DEPT ELECT ENGN, STANFORD, CA 94305 USA
[2] VARIAN RES CTR, PALO ALTO, CA 94303 USA
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 09期
关键词
BiSrCaCuO; Sputtering; Superconductor; Superlattice; Thin film; Transmission electron microscopy;
D O I
10.1143/JJAP.29.L1638
中图分类号
O59 [应用物理学];
学科分类号
摘要
In situ epitaxial growth of BiSrCaCuO films by three target sputtering was performed on MgO substrates at a temperature of 650°C. From high resolution transmission electron microscopy, the film showed a superstructure consisting of the alternate stacking of the low-Tc and high-Tc phases with a c-axis of 34 Å. The film in the [110] or [110] directions was parallel to<100>MgO, and the transient layers between the substrate and the film were less than a few atomic layers thick. X-ray diffraction simulations indicated that the films contained random layer ordering of 34 Å bi-layers (low-Tc+high-Tc and high-Tc+low-Tc) and random layer ordering of low-Tc and high-Tc phase layers. © 1990 The Japan Society of Applied Physics.
引用
收藏
页码:L1638 / L1641
页数:4
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