GLASS-SURFACE TREATMENT WITH EXCIMER AND CO2-LASERS

被引：70

作者：

BUERHOP, C ^{[1
]}

BLUMENTHAL, B ^{[1
]}

WEISSMANN, R ^{[1
]}

LUTZ, N ^{[1
]}

BIERMANN, S ^{[1
]}

机构：

[1] UNIV ERLANGEN NURNBERG,LEHRSTUHL FERTIGUNGSTECHNOL,FLE,W-8520 ERLANGEN,GERMANY

来源：

APPLIED SURFACE SCIENCE | 1990年 / 46卷 / 1-4期

关键词：

Heat Treatment--Laser Applications - Lasers; Carbon Dioxide--Radiation Effects - Lasers; Excimer--Radiation Effects;

D O I：

10.1016/0169-4332(90)90184-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Laser techniques were used for ablation and surface modification of glass. The experiments were carried out using a 50 W CO2 laser (10.6 μm) and a 40 W 2J/20 Hz XeCl excimer laser (308 nm). The IR radiation heats the sample surface locally. Lead glass was polished and vitreous silica was engraved. High power UV radiation causes ablation of glass with negligible thermal effects. This phenomenon is discussed on the basis of a photochemical mechanism. Removal rates of various glasses were determined. © 1990.

引用

页码：430 / 434

页数：5

共 5 条

[1] LASER ENERGY DEPOSITION AT SAPPHIRE SURFACES STUDIED BY PULSED PHOTOTHERMAL DEFORMATION
DREYFUS, RW
MCDONALD, FA
VONGUTFELD, RJ
[J]. APPLIED PHYSICS LETTERS, 1987, 50 (21) : 1491 - 1493
[2] Paul A., 1990, CHEM GLASS
[3] REIF J, UNPUB OPT ENG
[4] EFFECTS OF EXCIMER LASER IRRADIATION ON THE TRANSMISSION, INDEX OF REFRACTION, AND DENSITY OF ULTRAVIOLET GRADE FUSED-SILICA
ROTHSCHILD, M
EHRLICH, DJ
SHAVER, DC
[J]. APPLIED PHYSICS LETTERS, 1989, 55 (13) : 1276 - 1278
[5] ULTRAVIOLET-LASER ABLATION OF POLYIMIDE FILMS
SRINIVASAN, R
BRAREN, B
DREYFUS, RW
[J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (01) : 372 - 376

← 1 →