AN OVERVIEW OF THE MODIFIED CHEMICAL VAPOR-DEPOSITION (MCVD) PROCESS AND PERFORMANCE

被引:226
作者
NAGEL, SR
MACCHESNEY, JB
WALKER, KL
机构
关键词
D O I
10.1109/JQE.1982.1071596
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:459 / 476
页数:18
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