INSITU STUDIES OF THE EFFECTS OF ION-BEAMS ON MATERIALS USING THE ELECTRON-MICROSCOPE ION-BEAM INTERFACE

被引：31

作者：

ISHINO, S

KAWANISHI, H

FUKIYA, K

MUROGA, T

机构：

来源：

关键词：

D O I：

10.1109/TNS.1983.4332503

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1255 / 1258

页数：4

共 14 条

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[9] MUROGA T, 1981, J NUCL MATER, V103, P1349
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