VOLTAGE GENERATION ON CLEAVAGE OF SILICON

被引:10
作者
LI, DG
HANEMAN, D
MCALPINE, NS
CHEN, B
机构
[1] School of Physics, University of New South Wales, Sydney
关键词
D O I
10.1103/PhysRevLett.73.1170
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Voltage pulses up to 0.39 V are generated on cleaving Si wafers in air or vacuum. Current pulses up to 5 mA are also generated between contacts on either side of the crack. The phenomena are explained in terms of dipole generation due to loss of centrosymmetric properties about a crack.
引用
收藏
页码:1170 / 1173
页数:4
相关论文
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