IMPROVED COMPATIBILITY RELATIONS - APPLICATION TO X-RAY THRESHOLD OF LI

被引:4
作者
DOW, JD
ROBINSON, JE
机构
[1] UNIV ILLINOIS, DEPT PHYS, URBANA, IL 61801 USA
[2] UNIV ILLINOIS, MAT RES LAB, URBANA, IL 61801 USA
[3] ARGONNE NATL LAB, DIV SOLID STATE SCI, ARGONNE, IL 60439 USA
关键词
D O I
10.1103/PhysRevB.14.2683
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:2683 / 2686
页数:4
相关论文
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