IMPROVED COMPATIBILITY RELATIONS - APPLICATION TO X-RAY THRESHOLD OF LI

被引：4

作者：

DOW, JD

ROBINSON, JE

机构：

[1] UNIV ILLINOIS, DEPT PHYS, URBANA, IL 61801 USA

[2] UNIV ILLINOIS, MAT RES LAB, URBANA, IL 61801 USA

[3] ARGONNE NATL LAB, DIV SOLID STATE SCI, ARGONNE, IL 60439 USA

来源：

PHYSICAL REVIEW B | 1976年 / 14卷 / 06期

关键词：

D O I：

10.1103/PhysRevB.14.2683

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2683 / 2686

页数：4

共 22 条

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