TUNGSTEN TITANIUM NITRIDE LOW-RESISTANCE INTERCONNECTIONS DURABLE FOR HIGH-TEMPERATURE PROCESSING

被引：31

作者：

NAKASAKI, Y

SUGURO, K

SHIMA, S

KASHIWAGI, M

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 06期

关键词：

D O I：

10.1063/1.342493

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3263 / 3268

页数：6

共 16 条

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