GAS-PHASE REACTIONS OF CF3 AND CF2 WITH ATOMIC AND MOLECULAR FLUORINE - THEIR SIGNIFICANCE IN PLASMA-ETCHING

被引：66

作者：

PLUMB, IC

RYAN, KR

机构：

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1986年 / 6卷 / 01期

关键词：

D O I：

10.1007/BF00573818

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：11 / 25

页数：15

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