RECRYSTALLIZATION OF AMORPHIZED POLYCRYSTALLINE SILICON FILMS ON SIO2 - TEMPERATURE-DEPENDENCE OF THE CRYSTALLIZATION PARAMETERS

被引：289

作者：

IVERSON, RB

REIF, R

机构：

来源：

关键词：

D O I：

10.1063/1.339591

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1675 / 1681

页数：7

共 32 条

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