PARTICLE DISTRIBUTIONS AND LASER PARTICLE INTERACTIONS IN AN RF DISCHARGE OF SILANE

[1] ADLER D, 1985, MATERIALS ISSUES APP

[2] Chapman B., 1980, GLOW DISCHARGE PROCE, P65

[3] Gottscho R. A., 1985, Plasma Synthesis and Etching of Electronic Materials Symposium, P55

[4] ION DYNAMICS OF RF PLASMAS AND PLASMA SHEATHS - A TIME-RESOLVED SPECTROSCOPIC STUDY [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (07) : 2707 - 2714

[5] RF SPUTTERING VOLTAGE DIVISION BETWEEN 2 ELECTRODES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (01): : 60 - 68

[6] KOHLER K, 1985, J APPL PHYS, V57, P59, DOI 10.1063/1.335396

[7] Kushner M. J., 1985, Plasma Synthesis and Etching of Electronic Materials Symposium, P201

[8] MECHANISMS FOR POWER DEPOSITION IN AR/SIH4 CAPACITIVELY COUPLED RF DISCHARGES [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1986, 14 (02) : 188 - 196

[9] KUSHNER MJ, UNPUB J APPL PHYS

[10] The interaction of electron and positive ion space charges in cathode sheaths [J]. PHYSICAL REVIEW, 1929, 33 (06): : 0954 - 0989

[1] ADLER D, 1985, MATERIALS ISSUES APP

[2] Chapman B., 1980, GLOW DISCHARGE PROCE, P65

[3] Gottscho R. A., 1985, Plasma Synthesis and Etching of Electronic Materials Symposium, P55

[4] ION DYNAMICS OF RF PLASMAS AND PLASMA SHEATHS - A TIME-RESOLVED SPECTROSCOPIC STUDY [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (07) : 2707 - 2714

[5] RF SPUTTERING VOLTAGE DIVISION BETWEEN 2 ELECTRODES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (01): : 60 - 68

[6] KOHLER K, 1985, J APPL PHYS, V57, P59, DOI 10.1063/1.335396

[7] Kushner M. J., 1985, Plasma Synthesis and Etching of Electronic Materials Symposium, P201

[8] MECHANISMS FOR POWER DEPOSITION IN AR/SIH4 CAPACITIVELY COUPLED RF DISCHARGES [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1986, 14 (02) : 188 - 196

[9] KUSHNER MJ, UNPUB J APPL PHYS

[10] The interaction of electron and positive ion space charges in cathode sheaths [J]. PHYSICAL REVIEW, 1929, 33 (06): : 0954 - 0989