THERMAL-OXIDATION OF NIOBIUM NITRIDE FILMS AT TEMPERATURES FROM 20-DEGREES-C-400-DEGREES-C .1. THE SURFACE-REACTION

被引：25

作者：

FRANKENTHAL, RP

SICONOLFI, DJ

SINCLAIR, WR

BACON, DD

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 10期

关键词：

D O I：

10.1149/1.2119522

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：2056 / 2060

页数：5

相关论文

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