CORRELATED-INTERFACIAL-ROUGHNESS ANISOTROPY IN SI1-XGEX/SI SUPERLATTICES

被引:80
作者
PHANG, YH [1 ]
TEICHERT, C [1 ]
LAGALLY, MG [1 ]
PETICOLOS, LJ [1 ]
BEAN, JC [1 ]
KASPER, E [1 ]
机构
[1] AT&T BELL LABS,MURRAY HILL,NJ 07974
来源
PHYSICAL REVIEW B | 1994年 / 50卷 / 19期
关键词
D O I
10.1103/PhysRevB.50.14435
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Interfacial roughness in Si1-xGex/Si superlattices grown by molecular-beam epitaxy on vicinal Si(001) surfaces has been investigated using low-angle x-ray-diffraction diffuse-intensity measurements and atomic-force microscopy. The vertically correlated-interfacial roughness is, in specific situations, highly anisotropic and oriented with respect to the substrate miscut. The lateral length scale of the roughness is many times greater than the average separation of the substrate steps. The presence of the anisotropy depends on Ge concentration. A thermodynamic model for the interface morphology is presented. © 1994 The American Physical Society.
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页码:14435 / 14445
页数:11
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