INFLUENCE OF SPUTTERING PARAMETERS ON COMPOSITION OF MULTICOMPONENT FILMS

被引：53

作者：

CUOMO, JJ ^{[1
]}

GAMBINO, RJ ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,POB 218,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期

关键词：

D O I：

10.1116/1.568626

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：79 / 83

页数：5

共 8 条

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[3] INFLUENCE OF BIAS ON DEPOSITION OF METALLIC-FILMS IN RF AND DC SPUTTERING [J].

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[4] AMORPHOUS MAGNETIC-MATERIALS FOR BUBBLE-DOMAIN AND MAGNETOOPTICS APPLICATION [J].

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[5]

LEVITSKII SM, 1957, SOV PHYS-TECH PHYS, V27, P913

[6] ALLOY SPUTTERING STUDIES WITH IN-SITU AUGER ELECTRON SPECTROSCOPY [J].

TARNG, ML ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (06) :2449-&

[7]

VOSSEN JL, 1971, J VAC SCI TECHNOL, V8, P12

[8] PROPOSED MODEL FOR COMPOSITION OF SPUTTERED MULTICOMPONENT THIN FILMS [J].

WINTERS, HF ;

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JOURNAL OF APPLIED PHYSICS, 1969, 40 (07) :2996-&

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