ANNEALING OF INFRARED DEFECT ABSORPTION BANDS IN 40-MEV ELECTRON-IRRADIATED SILICON

被引:22
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CORELLI, JC
OEHLER, G
BECKER, JF
EISENTRA.KJ
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10.1063/1.1703129
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O59 [应用物理学];
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页码:1787 / &
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