THE EFFECT OF NON-ISOPLANATISM IN MICROGRAPHS TAKEN WITH AN ELECTRON-MICROSCOPE EQUIPPED WITH A FIELD-EMISSION GUN

被引:9
作者
HANSZEN, KJ
LAUER, R
ADE, G
机构
关键词
D O I
10.1016/S0304-3991(85)80007-3
中图分类号
TH742 [显微镜];
学科分类号
摘要
6
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页码:47 / 57
页数:11
相关论文
共 6 条
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ADE G, 1982, OPTIK, V63, P43
[2]  
ADE G, 1978, OPTIK, V50, P143
[3]  
ADE G, 1973, PTB APH3 PHYS TECHN
[4]  
HANSSEN KJ, 1972, OPTIK, V35, P567
[5]  
HANSZEN KJ, 1983, PTB APH20 PHYS TECHN
[6]   COMA-FREE ALIGNMENT OF HIGH-RESOLUTION ELECTRON-MICROSCOPES WITH AID OF OPTICAL DIFFRACTOGRAMS [J].
ZEMLIN, F ;
WEISS, K ;
SCHISKE, P ;
KUNATH, W ;
HERRMANN, KH .
ULTRAMICROSCOPY, 1978, 3 (01) :49-60