CRITICAL-FIELD PATTERNS IN OPTICAL FIBONACCI MULTILAYERS

被引:21
作者
CHOW, L [1 ]
GUENTHER, KH [1 ]
机构
[1] UNIV CENT FLORIDA,DEPT ELECT & COMP ENGN,ORLANDO,FL 32816
来源
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION | 1993年 / 10卷 / 10期
关键词
D O I
10.1364/JOSAA.10.002231
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Optical coatings with 13, 34, 55, and 89 quarter-wave layers of high- and low-index dielectric materials arranged in Fibonacci sequences F6, F8, F9, and F10, respectively, were deposited with use of a reactive low-voltage ion plating process. The calculated average transmission (T(ave)) for phi = (1/2 +/- 1/4)pi follows a power law T(ave) almost-equal-to N(m)-delta, where N(m) is the number of optical quarter-wave layers in a Fibonacci sequence F(m). The critical exponent delta for these multilayers is compared with a renormalization calculation of the exponent governing the total energy width for an electronic system of Fibonacci layers. Spectral-transmittance measurements of the experimental Fibonacci multilayers show some deviation from the calculated spectral transmittance, which is due primarily to absorption in the short-wavelength range, but these measurements do still indicate that the observed optical field patterns are critical.
引用
收藏
页码:2231 / 2235
页数:5
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