SCANNING-TUNNELING-MICROSCOPY STUDY OF THE THICK-FILM LIMIT OF KINETIC ROUGHENING

被引：149

作者：

PALASANTZAS, G

KRIM, J

机构：

[1] Physics Department, Northeastern University, Boston

来源：

PHYSICAL REVIEW LETTERS | 1994年 / 73卷 / 26期

关键词：

D O I：

10.1103/PhysRevLett.73.3564

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The spatial and temporal scaling behaviors of vapor-deposited silver films have been investigated by means of scanning tunneling microscopy for the film thickness range ≅10-1000 nm. The roughness, growth, and dynamic scaling exponents have been independently measured (α=0.82±0.05,β=0. 29±0.06,and z=2.5±0.5), and they exhibit no evolution with film thickness. © 1994 The American Physical Society.

引用

页码：3564 / 3567

页数：4