ENHANCED SENSITIVITY IN THE ELECTRON-BEAM RESIST POLY(METHYL METHACRYLATE) USING IMPROVED SOLVENT DEVELOPER

被引：16

作者：

MOHSIN, MA ^{[1
]}

COWIE, JMG ^{[1
]}

机构：

[1] UNIV STIRLING,DEPT CHEM,STIRLING FK9 4LA,SCOTLAND

来源：

POLYMER | 1988年 / 29卷 / 12期

关键词：

Cosolvent System - Positive Resist - Solvent Developer - Solvent-Precipitant System;

D O I：

10.1016/0032-3861(88)90102-4

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

(Edited Abstract)

引用

页码：2130 / 2135

页数：6

共 24 条

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[8] POLYMER CO-SOLVENT SYSTEMS .5. UPPER AND LOWER CRITICAL SOLUTION TEMPERATURES OF POLYSTYRENE IN N-ALKANES [J].

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[9]

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[10]

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