Growth of ODPA-APB polyimide films using molecular beam deposition, and their characterization

被引:5
作者
Dimitrakopoulos, CD
Kowalczyk, SP
Lee, KW
机构
[1] COLUMBIA UNIV, HENRY KRUMB SCH MINES, DEPT CHEM ENGN MAT SCI & MIN ENGN, NEW YORK, NY 10027 USA
[2] IBM CORP, RES, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
关键词
polyimide films; vapour deposition; molecular beam;
D O I
10.1016/0032-3861(96)81625-9
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
We report the first growth of polyimide ODPA-APB films by the molecular beam deposition (MBD) technique and characterize these films using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. MBD is a dry, ultra-high vacuum technique based on the co-deposition of monomers from two different sources, followed by a thermally induced polycondensation reaction to form polyimide. This technique is an alternative to standard wet processing techniques involving the use of solvents. As-deposited films consist largely of low-molecular-weight species. Heat-treated films are chemically indistinguishable from thermally cured, spin-coated films. Different heat treatment conditions are compared.
引用
收藏
页码:4983 / 4990
页数:8
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