NANOMETER STRUCTURES IN SEMICONDUCTORS FORMED BY LOW-ENERGY ION-IMPLANTATION

被引:5
作者
SHANNON, JM
CLEGG, JB
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D O I
10.1016/0042-207X(84)90126-X
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T [工业技术];
学科分类号
08 ;
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页码:193 / 197
页数:5
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