A COMPARATIVE-ANALYSIS OF GAAS AND SI ION-IMPLANTED MESFETS

被引:9
作者
ABUSAID, MF [1 ]
HAUSER, JR [1 ]
机构
[1] N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
关键词
D O I
10.1109/T-ED.1986.22593
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:908 / 912
页数:5
相关论文
共 12 条
[1]  
ABUSAID MF, 1984, THESIS N CAROLINA ST
[2]   IMPROVED MICROWAVE SILICON MESFET [J].
BAECHTOLD, W ;
WOLF, P .
SOLID-STATE ELECTRONICS, 1971, 14 (09) :783-+
[3]  
BATCHTOLD W, 1973, ELECTRON LETT, V9, P232
[4]   CALCULATION OF VELOCITY-FIELD CHARACTERISTIC FOR GALLIUM ARSENIDE [J].
BUTCHER, PN ;
FAWCETT, W .
PHYSICS LETTERS, 1966, 21 (05) :489-&
[5]  
GOLIO MJ, 1983, THESIS N CAROLINA ST
[6]  
GREILING QT, 1980, MICROWAVE SYSTEMS NE, V10, P48
[7]  
KENNEDY DP, 1970, IBM J RES DEV, V14, P97
[8]  
KREMER H, 1976, IEEE T ELECTRON DEVI, V23, P476
[9]  
LEE FS, 1983, HARDWARE SOFTWARE CO, pCH11
[10]  
LEHOVEC K, 1980, IEEE T ELECTRON DEVI, V27, P48