IMPROVED MICROWAVE SILICON MESFET

被引：11

作者：

BAECHTOLD, W

WOLF, P

机构：

来源：

SOLID-STATE ELECTRONICS | 1971年 / 14卷 / 09期

关键词：

D O I：

10.1016/S0038-1101(71)80003-5

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：783 / +

页数：1

共 19 条

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[3]

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[5]

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[7]

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[8]

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[9] PROJECTION MASKING, THIN PHOTORESIST LAYERS AND INTERFERENCE EFFECTS [J].

MIDDELHOEK, S .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) :117-+

[10] METALLIZATION PROCESSES IN FABRICATION OF SCHOTTKY-BARRIER FETS [J].

MIDDELHOEK, S .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) :148-+

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