CONTRAST ENHANCED PHOTORESISTS - PROCESSING AND MODELING

被引：53

作者：

GRIFFING, BF

WEST, PR

机构：

来源：

关键词：

D O I：

10.1002/pen.760231706

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：947 / 952

页数：6

共 6 条

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[2] KING MC, 1981, VLSI ELECTRONICS MIC, V1, P57
[3] OPTICAL REQUIREMENTS FOR PROJECTION LITHOGRAPHY
OLDHAM, WG
SUBRAMANIAN, S
NEUREUTHER, AR
[J]. SOLID-STATE ELECTRONICS, 1981, 24 (10) : 975 - 980
[4] SUB-MICRON OPTICAL LITHOGRAPHY USING AN INORGANIC RESIST-POLYMER BILEVEL SCHEME
TAI, KL
VADIMSKY, RG
KEMMERER, CT
WAGNER, JS
LAMBERTI, VE
TIMKO, AG
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (05): : 1169 - 1176
[5] 1970, Patent No. 3511653
[6] UNPUB ELECTRONIC DEV