OPTICAL REQUIREMENTS FOR PROJECTION LITHOGRAPHY

被引：12

作者：

OLDHAM, WG ^{[1
]}

SUBRAMANIAN, S ^{[1
]}

NEUREUTHER, AR ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720

来源：

关键词：

D O I：

10.1016/0038-1101(81)90120-9

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：975 / 980

页数：6

共 17 条

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DILL, FH
HORNBERGER, WP
HAUGE, PS
SHAW, JM
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[5] OPTICAL LITHOGRAPHY
DILL, FH
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 440 - 444
[6] COMPUTER-SIMULATION OF EXPOSURE AND DEVELOPMENT OF A POSITIVE PHOTORESIST
FUJIMORI, S
[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) : 615 - 623
[7] GLATZEL E, 1980, DEV SEMICONDUCTOR MI, V5
[8] ON THE DIFFRACTION THEORY OF OPTICAL IMAGES
HOPKINS, HH
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1953, 217 (1130): : 408 - 432
[9] KANO I, 1979, SPIE, V174, P48
[10] FUTURE-DEVELOPMENTS FOR 1-1 PROJECTION PHOTOLITHOGRAPHY
KING, MC
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 711 - 716