EFFECT OF MICROSTRUCTURE OF YBA2CU3OX FILMS ON POWER HANDLING CAPABILITY STUDIED WITH MICROSTRIP RESONATORS

被引:19
作者
YOSHITAKE, T [1 ]
TSUGE, H [1 ]
INUI, T [1 ]
机构
[1] NEC CORP LTD,RESOURCES & ENVIRONM PROTECT RES LABS,MIYAMAE KU,KAWASAKI,KANAGAWA 213,JAPAN
关键词
D O I
10.1063/1.357309
中图分类号
O59 [应用物理学];
学科分类号
摘要
Microwave properties of two types of YBa2Cu3Ox (YBCO) films with different microstructure have been studied at 4.2 K and 6 GHz. One type of film was grown at a constant substrate temperature of 705-degrees-C during the film growth (constant-growth films). The other type of film ws prepared with two-stage process: initial growth at a lower temperature of 630-degrees-C and subsequent higher-temperature deposition at 705-degrees-C (two-stage-growth films). Although both types of film have very similar intrinsic YBCO material properties such as c-axis lattice constant, T(c), and unloaded quality factor Q(u) at low power levels, quite different microwave properties are observed at high power levels. The two-stage-growth films with small grains less than 100 nm show fairly small power dependence of Q(u) and resonance frequency on input power up to + 10 dBm. On the other hand, the constant-growth films with large grains (approximately 200 nm) show significant changes in these properties, accompanied by an appearance of asymmetric resonance curves. These results show that the power handling capability of granular YBCO films is mainly affected by the extrinsic film microstructure and that the quality of the grain boundaries causes the difference in power dependence.
引用
收藏
页码:4256 / 4261
页数:6
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