INFLUENCE OF AR SPUTTERING PRESSURE ON ADHESION OF TIC FILMS TO STEEL SUBSTRATES

被引：20

作者：

MUKHERJEE, JL

WU, LC

GREENE, JE

COOK, HE

机构：

[1] UNIV ILLINOIS,DEPT MET,URBANA,IL 61801

[2] UNIV ILLINOIS,DEPT MECH ENGN,URBANA,IL 61801

[3] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 04期

关键词：

D O I：

10.1116/1.568686

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：850 / 853

页数：4

共 14 条

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[2] ADHESION OF METAL FILMS TO GLASS [J].

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WEAVER, C .

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[3] MEASUREMENT OF ADHESION OF THIN FILMS [J].

BENJAMIN, P ;

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[4]

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[5] STYLUS OR SCRATCH METHOD FOR THIN FILM ADHESION MEASUREMENT - SOME OBSERVATIONS AND COMMENTS [J].

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[6] TECHNIQUE FOR DETECTING CRITICAL LOADS IN SCRATCH TEST FOR THIN-FILM ADHESION [J].

GREENE, JE ;

WOODHOUSE, J ;

PESTES, M .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1974, 45 (06) :747-749

[7]

GREENE JE, TO BE PUBLISHED

[8] SOME FACTORS INFLUENCING THE ADHESION OF FILMS PRODUCED BY VACUUM EVAPORATION [J].

HEAVENS, OS .

JOURNAL DE PHYSIQUE ET LE RADIUM, 1950, 11 (07) :355-360

[9] STRUCTURE AND PROPERTIES OF SPUTTERED TITANIUM CARBIDE AND TITANIUM NITRIDE COATINGS [J].

MAH, G ;

NORDIN, CW ;

FULLER, JF .

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[10]

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