NOVEL POLYMERIC DISSOLUTION INHIBITOR FOR THE DESIGN OF SENSITIVE, DRY ETCH RESISTANT, BASE-DEVELOPABLE RESIST

被引：35

作者：

ITO, H

FLORES, E

RENALDO, AF

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 09期

关键词：

D O I：

10.1149/1.2096264

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：2328 / 2333

页数：6

相关论文

共 22 条

[1] VAPOR DEVELOPMENT OF POLY(OLEFIN SULFONE) RESISTS
BOWDEN, MJ
THOMPSON, LF
[J]. POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) : 525 - 528
[2] A SENSITIVE NOVOLAC-BASED POSITIVE ELECTRON RESIST
BOWDEN, MJ
THOMPSON, LF
FAHRENHOLTZ, SR
DOERRIES, EM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (06) : 1304 - 1313
[3] PHOTOSENSITIZED CATIONIC POLYMERIZATIONS USING DIALKYLPHENACYLSULFONIUM AND DIALKYL(4-HYDROXYPHENYL)SULFONIUM SALT PHOTOINITIATORS
CRIVELLO, JV
LEE, JL
[J]. MACROMOLECULES, 1981, 14 (05) : 1141 - 1147
[4] DYE-SENSITIZED PHOTOINITIATED CATIONIC POLYMERIZATION
CRIVELLO, JV
LAM, JHW
[J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1978, 16 (10) : 2441 - 2451
[5] DYE-SENSITIZED PHOTOINITIATED CATIONIC POLYMERIZATION - SYSTEM - PERYLENE-TRIARYLSULFONIUM SALTS
CRIVELLO, JV
LAM, JHW
[J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1979, 17 (04) : 1059 - 1065
[6] FRECHET JMJ, 1986, J IMAGING SCI, V30, P59
[7] Gozdz A. S., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P2, DOI 10.1117/12.963618
[8] HINSBERG WD, 1985, P SOC PHOTO-OPT INST, V539, P6, DOI 10.1117/12.947808
[9] HIRAOKA H, 1984, ACS SYM SER, V242, P55
[10] ITO H, 1984, ACS SYM SER, V242, P11