CHARACTERIZATION OF DAMAGE IN ION-IMPLANTED GE

被引:100
作者
APPLETON, BR
HOLLAND, OW
NARAYAN, J
SCHOW, OE
WILLIAMS, JS
SHORT, KT
LAWSON, E
机构
[1] ROYAL MELBOURNE INST TECHNOL,MELBOURNE,VIC 3000,AUSTRALIA
[2] AUSTRALIAN ATOM ENERGY COMMISS,LUCAS HTS,NSW 2232,AUSTRALIA
关键词
D O I
10.1063/1.93643
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:711 / 712
页数:2
相关论文
共 14 条
  • [1] APPLETON BR, UNPUB
  • [2] LASER-INDUCED REORDER IN PB IMPLANTED GE
    CAMPISANO, SU
    GRIMALDI, MG
    BAERI, P
    FOTI, G
    RIMINI, E
    [J]. APPLIED PHYSICS, 1980, 22 (02): : 201 - 203
  • [3] CHERNOW F, 1976, ION IMPLANTATION SEM
  • [4] Crowder Billy L., 1973, ION IMPLANTATION SEM
  • [5] HOLLAND OW, UNPUB
  • [6] Johansson N. G. E., 1970, Radiation Effects, V6, P257, DOI 10.1080/00337577008236304
  • [7] Mayer J. W., 1970, ION IMPLANTATION SEM
  • [8] NARAYAN J, UNPUB
  • [9] NARAYAN J, 1981, DEFECTS SEMICONDUCTO
  • [10] RIMINI E, 1979, LASER SOLID INTERACT, P259