NONCONTACT TECHNIQUE FOR LOCAL MEASUREMENT OF SEMICONDUCTOR RESISTIVITY

[1] ALLERTON GL, 1960, IRE T, VI 9, P175

[2] CONTACTLESS RESISTIVITY METER FOR SEMICONDUCTORS [J]. JOURNAL OF SCIENTIFIC INSTRUMENTS, 1961, 38 (07): : 307 - &

[3] HARNWELL GP, 1949, PRINCIPLES ELECTRICI, P101

[4] HOLM R, 1946, ELECTRICAL CONTACTS, P11

[5] ELECTRODELESS MEASUREMENT OF SEMICONDUCTOR RESISTIVITY AT MICROWAVE FREQUENCIES [J]. PROCEEDINGS OF THE INSTITUTE OF RADIO ENGINEERS, 1961, 49 (05): : 928 - &

[6] KOHANE T, 1960, IRE T INSTRUMENTATIO, VI 9, P184

[7] OLSHEFSKI PJ, 1961, SEMICONDUCTOR PRODUC, P34

[8] LOW-FREQUENCY CONDUCTIVITY DUE TO HOPPING PROCESSES IN SILICON [J]. PHYSICAL REVIEW, 1961, 122 (06): : 1742 - &

[9] RUDENBERG HG, 1959, SEMICONDUCTOR PRODUC, P28

[10] RADIO-FREQUENCY CARRIER AND CAPACTIVE COUPLING PROCEDURES FOR RESISTIVITY AND LIFETIME MEASUREMENTS ON SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (02) : 167 - 171

[1] ALLERTON GL, 1960, IRE T, VI 9, P175

[2] CONTACTLESS RESISTIVITY METER FOR SEMICONDUCTORS [J]. JOURNAL OF SCIENTIFIC INSTRUMENTS, 1961, 38 (07): : 307 - &

[3] HARNWELL GP, 1949, PRINCIPLES ELECTRICI, P101

[4] HOLM R, 1946, ELECTRICAL CONTACTS, P11

[5] ELECTRODELESS MEASUREMENT OF SEMICONDUCTOR RESISTIVITY AT MICROWAVE FREQUENCIES [J]. PROCEEDINGS OF THE INSTITUTE OF RADIO ENGINEERS, 1961, 49 (05): : 928 - &

[6] KOHANE T, 1960, IRE T INSTRUMENTATIO, VI 9, P184

[7] OLSHEFSKI PJ, 1961, SEMICONDUCTOR PRODUC, P34

[8] LOW-FREQUENCY CONDUCTIVITY DUE TO HOPPING PROCESSES IN SILICON [J]. PHYSICAL REVIEW, 1961, 122 (06): : 1742 - &

[9] RUDENBERG HG, 1959, SEMICONDUCTOR PRODUC, P28

[10] RADIO-FREQUENCY CARRIER AND CAPACTIVE COUPLING PROCEDURES FOR RESISTIVITY AND LIFETIME MEASUREMENTS ON SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (02) : 167 - 171