UHV-SEM OBSERVATIONS OF CLEANING PROCESS AND STEP FORMATION ON SILICON (111) SURFACES BY ANNEALING

被引：64

作者：

ISHIKAWA, Y

IKEDA, N

KENMOCHI, M

ICHINOKAWA, T

机构：

来源：

关键词：

D O I：

10.1016/0039-6028(85)90115-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：256 / 264

页数：9

共 5 条

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[2] OBSERVATION OF SURFACE MICRO-STRUCTURES BY MICRO-PROBE REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION
ICHIKAWA, M
DOI, T
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HAYAKAWA, K
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1984, 23 (07): : 913 - 920
[3] ISHIZAKA A, 1982, 2ND P INT C MBE CST
[4] OSAKABE N, 1981, SURF SCI, V102, P424, DOI 10.1016/0039-6028(81)90038-8
[5] OSAKABE N, 1980, SURFACE SCI, V97, P397