MICROFABRICATED SUBMICRON AL-FILAMENT BIPRISM AS APPLIED TO ELECTRON HOLOGRAPHY

被引：5

作者：

OGAI, K ^{[1
]}

KIMURA, Y ^{[1
]}

SHIMIZU, R ^{[1
]}

ISHIBASHI, K ^{[1
]}

AOYAGI, Y ^{[1
]}

NAMBA, S ^{[1
]}

机构：

[1] RIKEN,FRONTIER RES PROGRAM,WAKO,SAITAMA 35301,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 11B期

关键词：

ELECTRON HOLOGRAPHY; ELECTRON BIPRISM; AL-FILAMENT; SILICON NITRIDE MEMBRANE; MULTI-BIPRISM; LOCAL ELECTRIC FIELD;

D O I：

10.1143/JJAP.30.3272

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A novel type of electron blprism was made using a microprocess technique. This electron biprism is composed of several filaments lined in parallel on a silicon nitride membrane. Using this type of multi-biprism, we observed an electric field by electron interferometry and confirmed the potentiality of extending this technique to a local electric field.

引用

页码：3272 / 3276

页数：5