NANOMETER PATTERN DELINEATION BY ELECTRON AND ION-BEAM LITHOGRAPHY

[1] Andersen H. H., 1977, HYDROGEN STOPPING PO

[2] SUB-20-NM-WIDE METAL LINES BY ELECTRON-BEAM EXPOSURE OF THIN POLY(METHYL METHACRYLATE) FILMS AND LIFTOFF [J]. APPLIED PHYSICS LETTERS, 1981, 38 (06) : 436 - 439

[3] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J]. APPLIED PHYSICS LETTERS, 1976, 29 (09) : 596 - 598

[4] 250-A LINEWIDTHS WITH PMMA ELECTRON RESIST [J]. APPLIED PHYSICS LETTERS, 1978, 33 (05) : 392 - 394

[5] 10-NM LINEWIDTH ELECTRON-BEAM LITHOGRAPHY ON GAAS [J]. APPLIED PHYSICS LETTERS, 1983, 42 (01) : 38 - 40

[6] 400-A LINEWIDTH E-BEAM LITHOGRAPHY ON THICK SILICON SUBSTRATES [J]. APPLIED PHYSICS LETTERS, 1980, 36 (07) : 592 - 594

[7] INSITU VAPORIZATION OF VERY LOW-MOLECULAR WEIGHT RESISTS USING 1-2 NM DIAMETER ELECTRON-BEAMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1117 - 1120

[8] RANGES AND RANGE THEORIES [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1980, 47 (1-4): : 57 - 71

[9] ION-BEAM EXPOSURE PROFILES IN PMMA-COMPUTER SIMULATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1259 - 1263

[10] HIGH-RESOLUTION FABRICATION OF SUB-MICRON STRUCTURES BY ION-BEAM LITHOGRAPHY [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) : 69 - 72

[1] Andersen H. H., 1977, HYDROGEN STOPPING PO

[2] SUB-20-NM-WIDE METAL LINES BY ELECTRON-BEAM EXPOSURE OF THIN POLY(METHYL METHACRYLATE) FILMS AND LIFTOFF [J]. APPLIED PHYSICS LETTERS, 1981, 38 (06) : 436 - 439

[3] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J]. APPLIED PHYSICS LETTERS, 1976, 29 (09) : 596 - 598

[4] 250-A LINEWIDTHS WITH PMMA ELECTRON RESIST [J]. APPLIED PHYSICS LETTERS, 1978, 33 (05) : 392 - 394

[5] 10-NM LINEWIDTH ELECTRON-BEAM LITHOGRAPHY ON GAAS [J]. APPLIED PHYSICS LETTERS, 1983, 42 (01) : 38 - 40

[6] 400-A LINEWIDTH E-BEAM LITHOGRAPHY ON THICK SILICON SUBSTRATES [J]. APPLIED PHYSICS LETTERS, 1980, 36 (07) : 592 - 594

[7] INSITU VAPORIZATION OF VERY LOW-MOLECULAR WEIGHT RESISTS USING 1-2 NM DIAMETER ELECTRON-BEAMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1117 - 1120

[8] RANGES AND RANGE THEORIES [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1980, 47 (1-4): : 57 - 71

[9] ION-BEAM EXPOSURE PROFILES IN PMMA-COMPUTER SIMULATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1259 - 1263

[10] HIGH-RESOLUTION FABRICATION OF SUB-MICRON STRUCTURES BY ION-BEAM LITHOGRAPHY [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) : 69 - 72